Roger Cornell
Metrology Research Engineer Strategic Lithography at GlobalFoundries
SPIE Involvement:
Author
Area of Expertise:
semiconductor manufacturing , critical dimension metrology , scanning electron microscope , roughness metrology , big data datamining web application development , pattern fidelity and pattern placement error
Profile Summary

Enjoying the many challenges in the world's greatest miniaturization project of all time - the semiconductor industry.
The CDSEM images I make, allowing detailed observations and measurements of patterns magically imaged by lithography and transferred down through a stack of films by the wizardry of reactive ion etching always hold my interest.
To gage aspects of pattern fidelity including the metrology of roughness and pattern placement error is a focus in my current research. Previous work included backscattered electron imaging applications in CDSEM, CDSEM tool all inclusive data capture, data mining and analysis web based application development, statistical process control methods and improvements on prior methods, and industry adopted metrology tool performance measures and monitors, among others.
My interests include scanning and image formation in SEM, SEM detection methods and efficiency, SEM image analysis algorithm development, and SEM image simulation.
Publications (11)

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Metrology, Data modeling, Deep ultraviolet, Etching, Scanning electron microscopy, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Data mining, Metrology, Statistical analysis, Data modeling, Manufacturing, Diagnostics, Time metrology, Process control, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Metrology, Data modeling, Calibration, Silicon, 3D modeling, Atomic force microscopy, Scanning electron microscopy, 3D metrology, Semiconducting wafers, Nanowires

PROCEEDINGS ARTICLE | April 18, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Oxides, Metrology, Sensors, Silicon, Scanning electron microscopy, Transmission electron microscopy, 3D metrology, Semiconducting wafers, Signal detection, Nanowires

PROCEEDINGS ARTICLE | April 2, 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Lithography, Optical lithography, Scanners, Optical testing, Scanning electron microscopy, Scatterometry, Finite element methods, Line width roughness, Semiconducting wafers, Edge roughness

PROCEEDINGS ARTICLE | April 5, 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Reticles, Metrology, Optical lithography, Data modeling, Pattern recognition, Quality measurement, Time metrology, Optical proximity correction, Target recognition, Semiconducting wafers

Showing 5 of 11 publications
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