Prof. Roger H. French
F. Alex Nason Professor Of Materials Science at Case Western Reserve Univ
SPIE Involvement:
Conference Program Committee | Author
Publications (42)

PROCEEDINGS ARTICLE | September 18, 2018
Proc. SPIE. 10759, New Concepts in Solar and Thermal Radiation Conversion and Reliability
KEYWORDS: Spectroscopy, Solar cells, Climate change, Oceanography, Climatology

PROCEEDINGS ARTICLE | August 23, 2017
Proc. SPIE. 10370, Reliability of Photovoltaic Cells, Modules, Components, and Systems X
KEYWORDS: Photovoltaics, Polymers, Solar cells, Reliability, Raman spectroscopy, Optical inspection, Colorimetry, Infrared spectroscopy

PROCEEDINGS ARTICLE | August 23, 2017
Proc. SPIE. 10370, Reliability of Photovoltaic Cells, Modules, Components, and Systems X
KEYWORDS: Analytics, Photovoltaics, FT-IR spectroscopy, Polymers, Ultraviolet radiation, Solar cells, Infrared spectroscopy, Humidity, Absorbance, Statistical modeling

PROCEEDINGS ARTICLE | August 23, 2017
Proc. SPIE. 10370, Reliability of Photovoltaic Cells, Modules, Components, and Systems X
KEYWORDS: Optical properties, Reflection, Air contamination, Spectroscopy, Ultraviolet radiation, Solar cells, Light scattering, Refraction, Positron emission tomography, UV optics

PROCEEDINGS ARTICLE | August 23, 2017
Proc. SPIE. 10370, Reliability of Photovoltaic Cells, Modules, Components, and Systems X
KEYWORDS: Photovoltaics, FT-IR spectroscopy, Spectroscopy, Solar cells, Humidity, Climatology, Positron emission tomography

PROCEEDINGS ARTICLE | November 2, 2016
Proc. SPIE. 9938, Reliability of Photovoltaic Cells, Modules, Components, and Systems IX
KEYWORDS: Data modeling, Polymers, Solar cells, Nondestructive evaluation, Data acquisition, Meteorology, Feature selection, Climatology, Performance modeling, Atmospheric modeling

Showing 5 of 42 publications
Conference Committee Involvement (3)
Optical Microlithography XXIII
23 February 2010 | San Jose, California, United States
Optical Microlithography XXII
24 February 2009 | San Jose, California, United States
Optical Microlithography XXI
26 February 2008 | San Jose, California, United States
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