Dr. Roger Serwy
at Enthought Inc
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Image processing, Image analysis, Scanning electron microscopy, Gaussian filters, Image filtering, Line width roughness, Critical dimension metrology, Semiconducting wafers, Stochastic processes

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