Dr. Roger Sinta
at J&J Chemical Consulting
SPIE Involvement:
Author
Publications (30)

SPIE Journal Paper | 1 October 2006
JM3 Vol. 5 Issue 04
KEYWORDS: Polymers, Surface roughness, Polymer thin films, Line edge roughness, Line width roughness, Photoresist processing, Profiling, Atomic force microscopy, Semiconducting wafers, Lithography

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, FT-IR spectroscopy, Polymers, Surface roughness, Atomic force microscopy, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Photolysis, Standards development

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Polymers, Silicon, Surface roughness, Profiling, Line width roughness, Line edge roughness, Photoresist processing, Semiconducting wafers, Polymer thin films

Proceedings Article | 4 May 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Electron beams, Polymers, Molecules, Silicon, Diffusion, Surface roughness, Image resolution, Line edge roughness, Photoresist processing

SPIE Journal Paper | 1 January 2005
JM3 Vol. 4 Issue 01
KEYWORDS: Nanoparticles, Polymers, Pellicles, Absorbance, Polymer thin films, Nanocomposites, Particles, Transparency, Lithography, Silica

Showing 5 of 30 publications
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