Dr. Rolf Apetz
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (8)

SPIE Journal Paper | 29 May 2012
JM3 Vol. 11 Issue 02
KEYWORDS: Tin, Plasma, Extreme ultraviolet, Gas lasers, Extreme ultraviolet lithography, Photons, Mirrors, Light sources, Pulsed laser operation, Carbon monoxide

Proceedings Article | 7 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Semiconductors, Light sources, Scanners, Laser applications, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Semiconducting wafers, Plasma, Tin

Proceedings Article | 27 March 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Lithography, Capacitors, Electrodes, Ultraviolet radiation, Extreme ultraviolet, Extreme ultraviolet lithography, Pulsed laser operation, Astatine, Plasma, Tin

Proceedings Article | 23 March 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Electrodes, Scanners, Interfaces, Lamps, Reflectivity, Control systems, Extreme ultraviolet, Extreme ultraviolet lithography, Control systems design, Tin

Proceedings Article | 6 May 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Chemical species, Electrodes, Lamps, Reflectivity, Control systems, Xenon, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium, Tin

Showing 5 of 8 publications
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