Rolf Seltmann
at GLOBALFOUNDRIES Dresden Module Two GmbH & Co KG
SPIE Involvement:
Author
Publications (28)

Proceedings Article | 20 March 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Reticles, Scattering, Scanners, Light scattering, Photomasks, Logic devices, Source mask optimization

Proceedings Article | 20 October 2016
Proc. SPIE. 10032, 32nd European Mask and Lithography Conference
KEYWORDS: Semiconductors, Lithography, Error analysis, Manufacturing, Control systems, Scanning electron microscopy, Process control, Photomasks, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 19 March 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Optical filters, Metrology, Data modeling, Optical properties, Etching, Image segmentation, Signal processing, Optical simulations, Semiconducting wafers, Overlay metrology

Proceedings Article | 17 October 2014
Proc. SPIE. 9231, 30th European Mask and Lithography Conference
KEYWORDS: Lithography, Metrology, Etching, Control systems, Distortion, Photomasks, Plasma etching, Semiconductor manufacturing, Semiconducting wafers, Overlay metrology

Proceedings Article | 17 October 2014
Proc. SPIE. 9231, 30th European Mask and Lithography Conference
KEYWORDS: Lithography, Reticles, Optical lithography, Scanners, Manufacturing, 3D modeling, Photomasks, Optical proximity correction, Semiconducting wafers, Chemical mechanical planarization

Showing 5 of 28 publications
Proceedings Volume Editor (1)

SPIE Conference Volume | 16 March 2011

Conference Committee Involvement (1)
27th European Mask and Lithography Conference
18 January 2011 | Dresden, Germany
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