Rolf Seltmann
at RS Litho-consult
SPIE Involvement:
Author
Publications (31)

Proceedings Article | 22 February 2021 Presentation
Tino Hertzsch, Matthias Ruhm, Ofir Sharoni, Thomas Scheruebl, Rolf Seltmann
Proceedings Volume 11611, 1161120 (2021) https://doi.org/10.1117/12.2585642

Proceedings Article | 3 October 2019 Paper
Proceedings Volume 11148, 111480L (2019) https://doi.org/10.1117/12.2536896
KEYWORDS: Photomasks, Semiconducting wafers, Optical lithography, Critical dimension metrology, Failure analysis, Scanners, 3D modeling, Line width roughness, Reticles

Proceedings Article | 29 August 2019 Paper
Proceedings Volume 11177, 1117712 (2019) https://doi.org/10.1117/12.2535686
KEYWORDS: Semiconducting wafers, Printing, Logic, Photomasks, Critical dimension metrology, Lithography, Metrology, Manufacturing, Optical lithography, Metals

Proceedings Article | 20 March 2018 Paper
Bernd Geh, Alla Bitensky, Aravind Narayana Samy, Martin Sczyrba, Thomas Thamm, Rolf Seltmann, Marija Djordjevic Kaufmann
Proceedings Volume 10587, 105870F (2018) https://doi.org/10.1117/12.2297382
KEYWORDS: Photomasks, Scanners, Reticles, Light scattering, Scattering, Logic devices, Source mask optimization, Lithography

Proceedings Article | 20 October 2016 Paper
Proceedings Volume 10032, 100320I (2016) https://doi.org/10.1117/12.2248889
KEYWORDS: Photomasks, Critical dimension metrology, Semiconducting wafers, Manufacturing, Scanning electron microscopy, Error analysis, Semiconductors, Process control, Lithography, Control systems

Showing 5 of 31 publications
Proceedings Volume Editor (1)

SPIE Conference Volume | 16 March 2011

Conference Committee Involvement (2)
38th European Mask and Lithography Conference
19 June 2023 | Dresden, Germany
27th European Mask and Lithography Conference
18 January 2011 | Dresden, Germany
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