Dr. Romain Bange
at STMicroelectronics S.A.
SPIE Involvement:
Publications (6)

Proceedings Article | 5 October 2023 Paper
Mathis Urard, Clément Paquet, Charlotte Beylier, Jean-Noël Pena, Alice Caplier, Mauro Dalla Mura, Romain Bange, Roberto Guizzetti
Proceedings Volume 12802, 128020A (2023) https://doi.org/10.1117/12.2675612
KEYWORDS: Education and training, Machine learning, Optical proximity correction, Design and modelling, Databases, Photomasks, Source mask optimization, Lithography, Data modeling, Deep learning

Proceedings Article | 28 April 2023 Poster + Paper
Proceedings Volume 12494, 1249412 (2023) https://doi.org/10.1117/12.2657686
KEYWORDS: Scanners, Light sources and illumination, Semiconducting wafers, Contour extraction, Image filtering, Lithography, Automation, Scanning electron microscopy

Proceedings Article | 1 November 2022 Paper
Proceedings Volume 12472, 124720B (2022) https://doi.org/10.1117/12.2640124
KEYWORDS: Scanning electron microscopy, Metrology, Photomasks, Calibration, Reliability, Feature extraction, Critical dimension metrology, Matrices, Statistical analysis, Printing

Proceedings Article | 14 June 2022 Poster + Paper
Bertrand Le Gratiet, Régis Bouyssou, Julien Ducoté, Florent Dettoni, Thibaut Bourguignon, Vincent Morin, Romain Bange, Nivea Schuch, Julien Nicoulaud, Guillaume Renault, Frederic Robert, Thiago Figueiro
Proceedings Volume PC12053, PC120530S (2022) https://doi.org/10.1117/12.2615199
KEYWORDS: Metrology, Semiconducting wafers, Data integration, Visualization, Time metrology, Scanning electron microscopy, Manufacturing, Image quality, Image processing software, Image processing

Proceedings Article | 26 May 2022 Presentation + Paper
Thibaut Bourguignon, Régis Bouyssou, Jonathan Pradelles, Sébastien Bérard-Bergery, Bertrand Le-Gratiet, Romain Bange, Nivea Schuch, Thiago Figueiro, Nicolas Possémé
Proceedings Volume 12053, 120530C (2022) https://doi.org/10.1117/12.2613327
KEYWORDS: Overlay metrology, Scanning electron microscopy, Metrology, Image processing, Algorithm development, Feature extraction, Semiconducting wafers

Showing 5 of 6 publications
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