Dr. Roman Chalyck
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Publications (12)

Proceedings Article | 24 March 2017 Open Access Presentation + Paper
Seong-Sue Kim, Roman Chalykh, Hoyeon Kim, Seungkoo Lee, Changmin Park, Myungsoo Hwang, Joo-On Park, Jinhong Park, Hocheol Kim, Jinho Jeon, Insung Kim, Donggun Lee, Jihoon Na, Jungyeop Kim, Siyong Lee, Hyunwoo Kim, Seok-Woo Nam
Proceedings Volume 10143, 1014306 (2017) https://doi.org/10.1117/12.2264043
KEYWORDS: Extreme ultraviolet lithography, Manufacturing, Extreme ultraviolet, Pellicles, Photomasks, Transmittance, Logic, Scanners, Reticles, Chemical elements

Proceedings Article | 18 March 2016 Paper
Mun Ja Kim, Hwan Chul Jeon, Roman Chalykh, Eokbong Kim, Jihoon Na, Byung-Gook Kim, Heebom Kim, Chanuk Jeon, Seul-Gi Kim, Dong-Wook Shin, Taesung Kim, Sooyoung Kim, Jung Hun Lee, Ji-Beom Yoo
Proceedings Volume 9776, 97761Z (2016) https://doi.org/10.1117/12.2218228
KEYWORDS: Extreme ultraviolet lithography, Pellicles, Silicon, Extreme ultraviolet, Graphene, Crystals, Transmittance, Silicon films, Thin films, Lithography, Hydrogen, Infrared lasers, Thermography

Proceedings Article | 1 April 2013 Paper
Proceedings Volume 8679, 867903 (2013) https://doi.org/10.1117/12.2011076
KEYWORDS: Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Reflectivity, Extreme ultraviolet, Cadmium, Neodymium, Ions, Wafer-level optics

Proceedings Article | 7 March 2008 Paper
Proceedings Volume 6924, 69244H (2008) https://doi.org/10.1117/12.773203
KEYWORDS: Photomasks, Semiconducting wafers, Diffraction, Quartz, Distortion, Transmittance, Femtosecond phenomena, Refractive index, Binary data, Pulsed laser operation

Proceedings Article | 12 May 2007 Paper
Proceedings Volume 6607, 66070S (2007) https://doi.org/10.1117/12.728942
KEYWORDS: Scatterometry, 3D metrology, Extreme ultraviolet, Photomasks, Diffraction, Scatter measurement, Polarization, Metrology, Extreme ultraviolet lithography, Shape analysis

Showing 5 of 12 publications
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