Roman Liebe
Senior Process Engineer at Advanced Mask Technology Ctr
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 3 May 2007 Paper
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Metrology, Opacity, Calibration, Ultraviolet radiation, Microscopy, Atomic force microscopy, Scanning electron microscopy, Photomasks, Critical dimension metrology, Standards development

Proceedings Article | 21 June 2006 Paper
Proc. SPIE. 6281, 22nd European Mask and Lithography Conference
KEYWORDS: Metrology, Opacity, Etching, Ultraviolet radiation, Microscopy, Electrons, Scanning electron microscopy, Photomasks, Scanning probe microscopy, Critical dimension metrology

Proceedings Article | 20 May 2006 Paper
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Metrology, Calibration, Etching, Dry etching, Atomic force microscopy, Scanning electron microscopy, Photomasks, Critical dimension metrology, Photoresist processing, Phase shifts

Proceedings Article | 24 March 2006 Paper
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Semiconductors, Lithography, Electron beams, Electron microscopes, Scanning electron microscopy, Photomasks, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Standards development

Proceedings Article | 16 June 2005 Paper
Proc. SPIE. 5835, 21st European Mask and Lithography Conference
KEYWORDS: Deep ultraviolet, Opacity, Calibration, Ultraviolet radiation, Microscopy, Chromium, Scanning electron microscopy, Photomasks, Critical dimension metrology, Standards development

Showing 5 of 12 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top