Dr. Roman Sappey
Director of Technology at KLA Corp
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 23 September 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Semiconductors, Metrology, Manufacturing, Magnetism, Scatterometry, Process control, Nanoimprint lithography, Critical dimension metrology, Beam propagation method, Single crystal X-ray diffraction

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