Romuald Sabatier
at Institut Fresnel
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | September 23, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Metrology, Data modeling, Image segmentation, Image processing, Silicon, Scanning electron microscopy, Photomasks, Optical proximity correction, Semiconducting wafers, Process modeling

SPIE Journal Paper | July 1, 2009
JM3 Vol. 8 Issue 03
KEYWORDS: Reconstruction algorithms, System on a chip, Projection systems, Photomasks, Matrices, Optical lithography, Image transmission, Optical proximity correction, Vector spaces, Statistical analysis

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Optical lithography, Lithographic illumination, Imaging systems, Microscopy, Signal processing, Projection systems, Photomasks, Optical proximity correction, Reconstruction algorithms, System on a chip

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