Dr. Ron R. Bozak
Applications Manager at RAVE LLC
SPIE Involvement:
Conference Program Committee | Author
Publications (31)

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Calibration, Manufacturing, Inspection, Atomic force microscopy, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Phase shifts

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Multilayers, Manufacturing, Inspection, Reflectivity, Atomic force microscopy, Near field, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | June 30, 2012
Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX
KEYWORDS: Mathematical modeling, Nanotechnology, Metrology, Contamination, Nanoparticles, Particles, Inspection, Atomic force microscopy, Photomasks, Defect inspection

PROCEEDINGS ARTICLE | April 17, 2012
Proc. SPIE. 8352, 28th European Mask and Lithography Conference
KEYWORDS: Lithography, Reticles, Quartz, Air contamination, Image processing, Particles, Inspection, Pellicles, Photomasks, Semiconducting wafers

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Reticles, Opacity, Manufacturing, Atomic force microscopy, Photomasks, Source mask optimization, Computational lithography, Optimization (mathematics), Resolution enhancement technologies

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Femtosecond phenomena, Deep ultraviolet, Opacity, Quartz, Manufacturing, Chromium, Pellicles, Image transmission, Photomasks, Critical dimension metrology

Showing 5 of 31 publications
Conference Committee Involvement (11)
Photomask Technology
12 September 2016 | San Jose, California, United States
Photomask Technology 2015
29 September 2015 | Monterey, California, United States
Photomask Technology 2014
16 September 2014 | Monterey, California, United States
SPIE Photomask Technology
10 September 2013 | Monterey, California, United States
Photomask Technology
11 September 2012 | Monterey, California, United States
Showing 5 of 11 published special sections
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