Ron Eakin
Account Manager
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 23 June 2000
Proc. SPIE. 3999, Advances in Resist Technology and Processing XVII
KEYWORDS: Lithography, Deep ultraviolet, Etching, Polymers, Silicon, Coating, Fourier transforms, Thin film coatings, Semiconducting wafers, Bottom antireflective coatings

Proceedings Article | 23 June 2000
Proc. SPIE. 3999, Advances in Resist Technology and Processing XVII
KEYWORDS: Lithography, Optical lithography, Polymers, Diffusion, Coating, Chemistry, Photoresist materials, Chemical reactions, Photoresist processing, Resolution enhancement technologies

Proceedings Article | 11 June 1999
Proc. SPIE. 3678, Advances in Resist Technology and Processing XVI
KEYWORDS: Oxides, Lithography, Antireflective coatings, Deep ultraviolet, Reflectivity, Critical dimension metrology, Thin film coatings, Photoresist processing, Semiconducting wafers, Chemical mechanical planarization

Proceedings Article | 29 June 1998
Proc. SPIE. 3333, Advances in Resist Technology and Processing XV
KEYWORDS: Antireflective coatings, Etching, Quartz, Silicon, Coating, Reflectivity, Photoresist materials, Silicon films, Thin film coatings, Semiconducting wafers

Proceedings Article | 7 July 1997
Proc. SPIE. 3049, Advances in Resist Technology and Processing XIV
KEYWORDS: Optical lithography, Etching, Image processing, Silicon, Coating, Reflectivity, Photoresist materials, Critical dimension metrology, Semiconducting wafers, Overlay metrology

Showing 5 of 7 publications
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