Dr. Ronald A. Della Guardia
Engineer at IBM Thomas J Watson Research Ctr
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 30 March 2010 Paper
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Polishing, Optical lithography, Etching, Copper, Dielectrics, Photoresist materials, Reactive ion etching, Semiconducting wafers, Back end of line

Proceedings Article | 26 March 2010 Paper
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Optical lithography, Einsteinium, Etching, Dielectrics, Photoresist materials, Nanoimprint lithography, Reactive ion etching, Semiconducting wafers, Back end of line

Proceedings Article | 28 May 2004 Paper
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Etching, Metals, Image processing, Silicon, Finite element methods, Photomasks, Critical dimension metrology, Semiconducting wafers, Back end of line

Proceedings Article | 30 July 2002 Paper
Proc. SPIE. 4691, Optical Microlithography XV
KEYWORDS: Lithography, Printing, Photoresist materials, Photomasks, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Tolerancing, 193nm lithography, Phase shifts

Proceedings Article | 24 July 2002 Paper
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Lithography, Statistical analysis, Image processing, Manufacturing, Photoresist materials, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers, Photoresist developing

Showing 5 of 11 publications
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