Dr. Ronald J. G. Goossens
Director of Product Marketing at ASML US Inc
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Semiconductors, Analytics, Lithography, Metrology, Optical lithography, Contamination, Data modeling, Sensors, Process control, Neural networks, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 24 March 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Metrology, Lithographic illumination, Data modeling, Calibration, Image processing, Scanners, Laser scanners, Process control, Finite element methods, Photomasks, Computational lithography, 3D scanning, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 25 March 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Lithography, Cadmium, Data modeling, Calibration, Computer simulations, 3D modeling, Computational lithography, Optical proximity correction, Photoresist processing, Semiconducting wafers

Proceedings Article | 12 April 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Wafer-level optics, Metrology, Optical lithography, Diffractive optical elements, Cadmium, Databases, Scanners, Critical dimension metrology, Semiconducting wafers, Optics manufacturing

Proceedings Article | 2 April 2011
Proc. SPIE. 7985, 27th European Mask and Lithography Conference
KEYWORDS: Metrology, Data modeling, Calibration, Scanners, Printing, Photomasks, Critical dimension metrology, Optimization (mathematics), Semiconducting wafers, Model-based design

Showing 5 of 11 publications
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