Dr. Ronald L. Jones
Research Assistant at National Institute of Standards and Technology
SPIE Involvement:
Author
Publications (22)

Proceedings Article | 24 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Data modeling, Scattering, Sensors, X-rays, Dielectrics, Silicon, Laser scattering, Scanning electron microscopy, Transistors, Critical dimension metrology

Proceedings Article | 28 March 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Electron beam lithography, Optical lithography, Scattering, Skin, X-rays, Dielectrics, Silicon, Reflectivity, Picosecond phenomena, Nanoimprint lithography

Proceedings Article | 24 March 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Diffraction, Scattering, Sensors, X-rays, Laser scattering, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Line edge roughness

Proceedings Article | 24 March 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Diffraction, Metrology, Scattering, Satellites, X-rays, X-ray diffraction, Collimation, Line width roughness, Synchrotrons, Line edge roughness

Proceedings Article | 5 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Diffraction, Scattering, Sensors, Satellites, X-rays, Photoresist materials, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Line edge roughness

Showing 5 of 22 publications
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