Dr. Ronald L. Jones
Research Assistant at National Institute of Standards and Technology
SPIE Involvement:
Author
Publications (22)

Proceedings Article | 24 March 2009 Paper
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Dielectrics, Scanning electron microscopy, Scattering, X-rays, Data modeling, Sensors, Transistors, Critical dimension metrology, Laser scattering, Silicon

Proceedings Article | 28 March 2008 Paper
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Dielectrics, Reflectivity, Picosecond phenomena, Nanoimprint lithography, X-rays, Skin, Scattering, Optical lithography, Electron beam lithography, Silicon

Proceedings Article | 24 March 2008 Paper
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Line width roughness, Line edge roughness, Diffraction, X-rays, Critical dimension metrology, Scattering, Sensors, Laser scattering, Extreme ultraviolet lithography, Extreme ultraviolet

Proceedings Article | 24 March 2008 Paper
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Diffraction, Line width roughness, Line edge roughness, Synchrotrons, X-rays, Satellites, Metrology, X-ray diffraction, Collimation, Scattering

Proceedings Article | 5 April 2007 Paper
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Line width roughness, Line edge roughness, Diffraction, Critical dimension metrology, Photoresist materials, X-rays, Scattering, Satellites, Extreme ultraviolet lithography, Sensors

Showing 5 of 22 publications
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