Ronald J. Lesnick
R&D Engineer at Synopsys Inc
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | May 20, 2011
Proc. SPIE. 8081, Photomask and Next-Generation Lithography Mask Technology XVIII
KEYWORDS: Human-machine interfaces, Lithography, Metrology, Visualization, Interfaces, Image analysis, Image registration, Photomasks, Double patterning technology, 193nm lithography

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Metrology, Chromium, Quality measurement, Scanning electron microscopy, Distance measurement, Computed tomography, Optical proximity correction, Critical dimension metrology, Overlay metrology, Edge roughness

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