The increasing demands for registration metrology for repeatability, accuracy, and resolution in order to be able to
perform measurements in the active area on production features have prompted the development of PROVETM, the nextgeneration
registration metrology tool that utilizes 193nm illumination and a metrology stage that is actively controlled
in all six degrees of freedom. PROVETM addresses full in-die capability for double patterning lithography and
sophisticated inverse-lithography schemes. Innovative approaches for image analysis, such as 2D correlation, have
been developed to achieve this demanding goal.
In order to take full advantage of the PROVETM resolution and measurement capabilities, a direct link to the mask data
preparation for job automation and marker identification is inevitable. This paper describes an integrated solution using
Synopsys' CATSR for extracting and preparing tool-specific job input data for PROVE. In addition to the standard
marking functionalities, CATSR supports the 2D correlation method by providing reference clips in OASIS.MASK
With every new process generation mask complexity and costs continue to increase, driving new requirements for
critical dimension control and mask qualification. Identifying and categorizing features to be measured and verified
during mask qualification has now become critical to ensure high yielding masks. Traditional line width and spacing
measurements are no longer sufficient for CD metrology systems. Next-generation CD-SEM systems and software tools
now include more complex mask metrology requirements including measurements of pitch, "ternary contact", corner
rounding, overlay, and line-edge roughness. Additionally these systems have started providing the capability for
multiple measurement sites within a single field-of-view.
In advanced mask production facilities, mask qualification recipes are commonly generated offline to improve the
quality and efficiency of such qualifications. Offline recipe generation has become even more important since new
process generations require an increasing number of measurements per mask. This paper describes offline recipe
generation procedures using CATSTM marking, also referred to as 'software tools' to utilize the new features of advanced
CD-SEM metrology systems.