Ronald Otten
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 29 August 2019 Paper
Proc. SPIE. 11177, 35th European Mask and Lithography Conference (EMLC 2019)
KEYWORDS: Metrology, Scanners, Annealing, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Etching, Scanners, Annealing, Silicon, Distortion, Silicon films, Optical alignment, Semiconducting wafers, Performance modeling, Overlay metrology

Proceedings Article | 12 June 2018 Paper
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Reticles, Deep ultraviolet, Scanners, Distortion, Image registration, Pellicles, Photomasks, Optical alignment, Semiconducting wafers, Overlay metrology

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