Dr. Rongkuo Zhao
Postdoc Research Fellow
SPIE Involvement:
Publications (8)

Proceedings Article | 28 April 2023 Paper
Rongkuo Zhao, Fan Zhou, Jialei Tang, Jeff Lu, Yunbo Liu, Dezheng Sun, Ming-Chun Tien, Stephen Hsu, Rachit Gupta, Youping Zhang, Joerg Zimmermann
Proceedings Volume 12495, 124950R (2023) https://doi.org/10.1117/12.2660858
KEYWORDS: Source mask optimization, SRAF, Light sources and illumination, Extreme ultraviolet, 3D mask effects, Image quality, Computational lithography

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12494, 124940Q (2023) https://doi.org/10.1117/12.2658511
KEYWORDS: Photomasks, Optical proximity correction, Reflection, Critical dimension metrology, Tantalum, Reflectivity, Metrology, Semiconducting wafers, Scanners, Reticles

Proceedings Article | 31 October 2022 Poster
Natalia Davydova, Vincent Wiaux, Joost Bekaert, Frank Timmermans, Bram Slachter, Tatiana Kovalevich, Eelco van Setten, Marcel Beckers, Simon van Gorp, Rongkuo Zhao, Dezheng Sun, Ming-Chun Tien, Hoon Ser, Diederik de Bruin, Stephen Hsu, Rene Carpaij
Proceedings Volume PC12292, PC1229210 (2022) https://doi.org/10.1117/12.2653388
KEYWORDS: Tantalum, Image resolution, Source mask optimization, Scanners, Reflectivity, Optical proximity correction, Manufacturing, Extreme ultraviolet lithography, Control systems

Proceedings Article | 3 October 2022 Presentation
Proceedings Volume PC12198, PC1219819 (2022) https://doi.org/10.1117/12.2640648

Proceedings Article | 13 June 2022 Presentation
Proceedings Volume PC12051, PC120510B (2022) https://doi.org/10.1117/12.2615263
KEYWORDS: Imaging systems, Process control, Photoresist materials, Lithography, 3D image processing, Semiconducting wafers, Scanners, Overlay metrology, Optical lithography, Image processing

Showing 5 of 8 publications
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