Ms. Roswitha Remling
at
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | July 19, 2000
Proc. SPIE. 4066, Photomask and Next-Generation Lithography Mask Technology VII
KEYWORDS: Lithography, Reticles, Contamination, Silica, Manufacturing, Chromium, Pellicles, Transmittance, Photomasks, Semiconducting wafers

PROCEEDINGS ARTICLE | February 12, 1997
Proc. SPIE. 3236, 17th Annual BACUS Symposium on Photomask Technology and Management
KEYWORDS: Carbon, Reticles, Manufacturing, Scanning electron microscopy, Ion beams, Solids, Photomasks, Critical dimension metrology, Semiconducting wafers, Gallium

PROCEEDINGS ARTICLE | December 7, 1994
Proc. SPIE. 2322, 14th Annual BACUS Symposium on Photomask Technology and Management
KEYWORDS: Carbon, Opacity, Quartz, Ions, Atomic force microscopy, Ion beams, Photomasks, Multiplexers, Photomask technology, Phase shifts

PROCEEDINGS ARTICLE | February 15, 1994
Proc. SPIE. 2087, 13th Annual BACUS Symposium on Photomask Technology and Management
KEYWORDS: Carbon, Etching, Quartz, Manufacturing, Chromium, Photomasks, Semiconducting wafers, Photomask technology, Laser systems engineering, Phase shifts

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