Dr. Ru-Gun Liu
Director at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Conference Program Committee | Author
Publications (26)

Proceedings Article | 19 March 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Monte Carlo methods, Photomasks, Beam shaping, Critical dimension metrology, Model-based design, Process modeling, Vestigial sideband modulation

Proceedings Article | 15 March 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Diffraction, Polarization, Polarizers, Image quality, Transmittance, Photomasks, Immersion lithography, Dielectric polarization, Diffraction gratings

Proceedings Article | 19 March 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Diffraction, Scattering, Calibration, Inspection, 3D modeling, 3D metrology, Wafer inspection, Photomasks, Semiconducting wafers, 3D image processing

Proceedings Article | 31 March 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Visual process modeling, Data modeling, Calibration, Diffusion, 3D modeling, Scanning electron microscopy, Optical proximity correction, Semiconducting wafers, 3D image processing

Proceedings Article | 12 April 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Diffraction, Spectrum analysis, Polarization, Reflectivity, Control systems, Photomasks, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 10 April 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Lithography, Calibration, Diffusion, 3D modeling, Scanning electron microscopy, Photoresist materials, Optical proximity correction, Critical dimension metrology, Performance modeling, 3D image processing

Showing 5 of 26 publications
Conference Committee Involvement (9)
Design-Process-Technology Co-optimization for Manufacturability XIV
23 February 2020 | San Jose, California, United States
Advanced Etch Technology for Nanopatterning IX
23 February 2020 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability XIII
27 February 2019 | San Jose, California, United States
Advanced Etch Technology for Nanopatterning VIII
25 February 2019 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability XII
28 February 2018 | San Jose, California, United States
Showing 5 of 9 published special sections
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