Mr. Ray Hsu
Technical Sales Manager at Dow Chemical Co
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Lithography, Logic, Polymers, Diffusion, Photoresist materials, Polymerization, Photomasks, Photoresist processing, Photoresist developing, 193nm lithography

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Wafer-level optics, Lithography, 3D modeling, Scanning electron microscopy, Photomasks, Source mask optimization, Optical proximity correction, Molybdenum, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | April 15, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Optical lithography, Reflection, Etching, Metals, Reflectivity, Line width roughness, Immersion lithography, Logic devices, Critical dimension metrology

PROCEEDINGS ARTICLE | April 5, 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Semiconductors, Error analysis, Nondestructive evaluation, Atomic force microscopy, Scanning electron microscopy, Transmission electron microscopy, Line width roughness, Optical proximity correction, Critical dimension metrology, Line edge roughness

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Optical lithography, Etching, Inspection, Scanning electron microscopy, Photoresist materials, Finite element methods, Photomasks, Critical dimension metrology, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Optical lithography, Etching, Copper, Coating, Scanning electron microscopy, Photoresist materials, Critical dimension metrology, Semiconducting wafers, Optics manufacturing

Showing 5 of 7 publications
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