Ruixuan Huang
Senior Associate engineer at Semiconductor Manufacturing International Corp
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | March 17, 2015
Proc. SPIE. 9428, Advanced Etch Technology for Nanopatterning IV
KEYWORDS: Continuous wave operation, Etching, Metals, Ions, Silicon, Process control, Anisotropic etching, Plasma, Tin

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