Dr. Ruoping Wang
Sr. Development Engineer at NXP Semiconductors
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 20 March 2018 Paper
Proc. SPIE. 10588, Design-Process-Technology Co-optimization for Manufacturability XII
KEYWORDS: Metrology, Inspection, Profiling, Photomasks, Image classification, Optical proximity correction, Algorithm development, Standards development, Resolution enhancement technologies, Classification systems

Proceedings Article | 6 May 2005 Paper
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Lithography, Reticles, Data modeling, Calibration, 3D modeling, 3D metrology, Transmittance, Photomasks, Optical proximity correction, Phase shifts

Proceedings Article | 6 December 2004 Paper
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Data modeling, Chromium, Photomasks, Optical proximity correction, Critical dimension metrology, Tolerancing, Binary data, Model-based design, Phase shifts

Proceedings Article | 11 March 2002 Paper
Proc. SPIE. 4562, 21st Annual BACUS Symposium on Photomask Technology
KEYWORDS: Optical lithography, Polarization, Opacity, Quartz, Manufacturing, Printing, Photomasks, Integrated circuits, Neodymium, Phase shifts

Proceedings Article | 14 September 2001 Paper
Proc. SPIE. 4346, Optical Microlithography XIV
KEYWORDS: Logic, Optical lithography, Cadmium, Chromium, Optical proximity correction, Critical dimension metrology, Data conversion, Semiconducting wafers, Binary data, Phase shifts

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