Dr. Ruoping Wang
Sr. Development Engineer at NXP Semiconductors
SPIE Involvement:
Publications (5)

Proceedings Article | 20 March 2018
Proc. SPIE. 10588, Design-Process-Technology Co-optimization for Manufacturability XII
KEYWORDS: Optical proximity correction, Inspection, Metrology, Image classification, Photomasks, Resolution enhancement technologies, Algorithm development, Standards development, Classification systems, Profiling

Proceedings Article | 6 May 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: 3D modeling, Photomasks, Optical proximity correction, Calibration, Data modeling, Transmittance, Phase shifts, Reticles, Lithography, 3D metrology

Proceedings Article | 6 December 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Optical proximity correction, Photomasks, Chromium, Phase shifts, Data modeling, Model-based design, Critical dimension metrology, Reticles, Binary data, Tolerancing

Proceedings Article | 11 March 2002
Proc. SPIE. 4562, 21st Annual BACUS Symposium on Photomask Technology
KEYWORDS: Photomasks, Phase shifts, Polarization, Printing, Optical lithography, Manufacturing, Neodymium, Opacity, Quartz, Integrated circuits

Proceedings Article | 14 September 2001
Proc. SPIE. 4346, Optical Microlithography XIV
KEYWORDS: Critical dimension metrology, Phase shifts, Binary data, Optical lithography, Optical proximity correction, Cadmium, Data conversion, Chromium, Semiconducting wafers, Logic

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