Russell J. Boten
Photolithography Manager at WaferTech LLC
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Optical filters, Phase modulation, Particles, Interfaces, Resistance, Photoresist materials, Adsorption, Photoresist processing, Semiconducting wafers, Photoresist developing

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