Russell J. Dover
Product Marketing Manager at Lam Research
SPIE Involvement:
Author
Profile Summary

Currently focused on defending and growing market share, partnering with customers to develop a compelling product roadmap and creating growth opportunities in computational lithography (optical modelling).

I'm a results-driven product and services marketing and business development professional with 15+ years of comprehensive experience and visible achievements in high tech product marketing. I offer great skills and experience in product development (hardware and software), services marketing, business management, multi-tier communication (customers, engineers, executive management etc.) and people management.
Specialties

My area of expertise are data & market analysis, benchmarking, requirements creation, business development, business plans, competitive analysis, product development, direct marketing, market research, messaging, negotiation, positioning, process engineering, project management, sales support, sales training, strategic planning, market validation
Publications (17)

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Calibration, Metals, Scanners, Wavefronts, Scanning electron microscopy, Photomasks, Source mask optimization, Optical proximity correction, Semiconducting wafers

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Etching, Metals, Computer simulations, 3D modeling, Scanning electron microscopy, Optical proximity correction, Photoresist processing, Semiconducting wafers, 3D image processing

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Etching, Metals, Image processing, Image quality, Photomasks, Image enhancement, Optical proximity correction, Nanoimprint lithography, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Lithography, Electron beam lithography, Data modeling, Calibration, 3D modeling, Atomic force microscopy, Scanning electron microscopy, Double patterning technology, Data centers, Photoresist processing

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Lithium, Scanning electron microscopy, Photomasks, Image enhancement, Source mask optimization, Computational lithography, Optical proximity correction, SRAF, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Etching, Image processing, Electroluminescence, Scanning electron microscopy, Finite element methods, Source mask optimization, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Showing 5 of 17 publications
Conference Committee Involvement (8)
SEMI IEEE Advanced Semiconductor Manufacturing Conference (ASMC)
15 May 2012 |
SEMI IEE Advanced Semiconductor Manufacturing Conference (ASMC)
16 May 2011 |
SEMI IEE Advanced Semiconductor Manufacturing Conference (ASMC)
12 July 2010 |
SEMI IEE Advanced Semiconductor Manufacturing Conference (ASMC)
5 May 2008 |
SEMI IEE Advanced Semiconductor Manufacturing Conference (ASMC)
11 June 2007 |
Showing 5 of 8 published special sections
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