Russell J. Dover
Product Marketing Manager at Lam Research
SPIE Involvement:
Profile Summary

Currently focused on defending and growing market share, partnering with customers to develop a compelling product roadmap and creating growth opportunities in computational lithography (optical modelling).

I'm a results-driven product and services marketing and business development professional with 15+ years of comprehensive experience and visible achievements in high tech product marketing. I offer great skills and experience in product development (hardware and software), services marketing, business management, multi-tier communication (customers, engineers, executive management etc.) and people management.

My area of expertise are data & market analysis, benchmarking, requirements creation, business development, business plans, competitive analysis, product development, direct marketing, market research, messaging, negotiation, positioning, process engineering, project management, sales support, sales training, strategic planning, market validation
Publications (17)

Proceedings Article | 12 April 2013 Paper
Qing Yang, CongShu Zhou, ShyueFong Quek, Mark Lu, YeeMei Foong, JianHong Qiu, Taksh Pandey, Russell Dover
Proceedings Volume 8683, 868326 (2013)
KEYWORDS: Image quality, Image processing, Optical proximity correction, Semiconducting wafers, Etching, Metals, Resolution enhancement technologies, Photomasks, Nanoimprint lithography, Image enhancement

Proceedings Article | 12 April 2013 Paper
Qing Yang, ShyueFong Quek, YeeMei Foong, Jens Hassmann, DongQing Zhang, Andre Leschok, Tang Yun, Mu Feng, Stanislas Baron, JianHong Qiu, Taksh Pandey, Bo Yan, Russell Dover
Proceedings Volume 8683, 86831N (2013)
KEYWORDS: 3D modeling, Optical proximity correction, Etching, Photoresist processing, Semiconducting wafers, Metals, 3D image processing, Scanning electron microscopy, Computer simulations, Lithography

Proceedings Article | 12 April 2013 Paper
A. Szucs, J. Planchot, V. Farys, E. Yesilada, C. Alleaume, L. Depre, R. Dover, C. Gourgon, M. Besacier, A. Nachtwein, P. Rusu
Proceedings Volume 8683, 868313 (2013)
KEYWORDS: Wavefronts, Photomasks, Calibration, Scanning electron microscopy, Semiconducting wafers, Scanners, Lithography, Metals, Optical proximity correction, Source mask optimization

Proceedings Article | 8 November 2012 Paper
Sylvain Moulis, Vincent Farys, Jérôme Belledent, Romain Thérèse, Song Lan, Qian Zhao, Mu Feng, Laurent Depre, Russell Dover
Proceedings Volume 8522, 85220A (2012)
KEYWORDS: Scanning electron microscopy, Data modeling, Atomic force microscopy, Calibration, Data centers, 3D modeling, Lithography, Photoresist processing, Double patterning technology, Electron beam lithography

Proceedings Article | 13 March 2012 Paper
DongQing Zhang, GekSoon Chua, YeeMei Foong, Yi Zou, Stephen Hsu, Stanislas Baron, Mu Feng, Hua-Yu Liu, Zhipan Li, Jessy Schramm, T. Yun, Carl Babcock, Byoung IL Choi, Stefan Roling, Alessandra Navarra, Tanja Fischer, Andre Leschok, Xiaofeng Liu, Weijie Shi, Jianhong Qiu, Russell Dover
Proceedings Volume 8326, 83261V (2012)
KEYWORDS: Source mask optimization, Optical proximity correction, Semiconducting wafers, Lithography, Electroluminescence, Scanning electron microscopy, Finite element methods, Etching, Critical dimension metrology, Image processing

Showing 5 of 17 publications
Conference Committee Involvement (8)
SEMI IEEE Advanced Semiconductor Manufacturing Conference (ASMC)
15 May 2012 |
SEMI IEE Advanced Semiconductor Manufacturing Conference (ASMC)
16 May 2011 |
SEMI IEE Advanced Semiconductor Manufacturing Conference (ASMC)
12 July 2010 |
SEMI IEE Advanced Semiconductor Manufacturing Conference (ASMC)
5 May 2008 |
SEMI IEE Advanced Semiconductor Manufacturing Conference (ASMC)
11 June 2007 |
Showing 5 of 8 Conference Committees
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