Russell Hudyma
President at Paragon Optics, Inc.
SPIE Involvement:
Conference Program Committee | Author | Instructor
Publications (27)

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Lithography, Mirrors, Metrology, Optical coatings, Wavefronts, Optical fabrication, Projection systems, Aspheric lenses, Extreme ultraviolet, Extreme ultraviolet lithography

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Lithography, Mirrors, Multilayers, Metrology, Wavefronts, Optical testing, Projection systems, Aspheric lenses, Extreme ultraviolet, Extreme ultraviolet lithography

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Lithography, Surface roughness, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Synchrotrons, Computer aided design, Line edge roughness, Semiconducting wafers

Proceedings Article | 21 March 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Optical components, Mirrors, Light sources, Reticles, Multiplexing, Extreme ultraviolet, Prototyping, Plasma, Light, Fiber optic illuminators

Proceedings Article | 8 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Microscopes, Mirrors, Reticles, Imaging systems, Scintillators, Inspection, Objectives, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics

Proceedings Article | 6 May 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Microscopes, Mirrors, Reticles, Scintillators, Inspection, Objectives, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, EUV optics

Showing 5 of 27 publications
Conference Committee Involvement (2)
Current Developments in Lens Design and Optical Engineering IV
3 August 2003 | San Diego, California, United States
Current Developments in Optical Engineering IX
2 August 2000 | San Diego, CA, United States
Course Instructor
SC005: Optical Design in the Ultraviolet
The emphasis of this course is on materials selection, basic design and development methods. Using a progressive series of case studies, image forming and beam shaping systems at wavelengths <404.7 nm (h-line) are discussed. These include wide-angle cameral lenses, microscope objectives, and optics for laser ablation. Anamorphic systems for excimer beam shaping and homgenization are covered. The course ends with high-NA catadioptic and all-reflective image systems for applications in the DUV and EUV, respectively.
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