Dr. Rusty Cantrell
Senior Process Engineer at Advanced Mask Technology Ctr GmbH Co KG
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Extreme ultraviolet, Photomasks, Metrology, Electron beam lithography, Reticles

Proceedings Article | 8 October 2014 Paper
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Photomasks, Metals, Calibration, Reticles, Electron beam lithography, Overlay metrology, Performance modeling, Data modeling, Instrument modeling, Visualization

Proceedings Article | 30 June 2012 Paper
Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX
KEYWORDS: Critical dimension metrology, Reticles, Photoresist processing, Photomasks, Principal component analysis, Inspection, Scanning electron microscopy, Spatial resolution, Lithography, Manufacturing

Proceedings Article | 17 April 2012 Paper
Proc. SPIE. 8352, 28th European Mask and Lithography Conference
KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Optical inspection, Extreme ultraviolet, Reflectivity, Defect detection, Mirrors, Scanning electron microscopy, Defect inspection

Proceedings Article | 14 October 2011 Paper
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Critical dimension metrology, Photoresist processing, Lithography, Reticles, Principal component analysis, Photomasks, Etching, Cadmium, Statistical analysis, Chemically amplified resists

Showing 5 of 12 publications
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