Ruty Katz
at Applied Materials Ltd
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 5 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Metrology, Scanning electron microscopy, Signal processing, Photomasks, Line width roughness, Computer aided design, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Edge roughness

Proceedings Article | 9 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Metrology, Manufacturing, Scanning electron microscopy, Photomasks, Integrated circuits, Critical dimension metrology, Line edge roughness, Photomask technology, Edge roughness

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