Ryan Chou
at Mentor Graphics Taiwan Ltd
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 13 March 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Logic, Visualization, Manufacturing, Printing, Photomasks, Optical proximity correction, SRAF, Resolution enhancement technologies, Fiber optic illuminators

Proceedings Article | 14 October 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Diffraction, Logic, Detection and tracking algorithms, Visualization, Photomasks, Optical proximity correction, Critical dimension metrology, Feedback control, Semiconducting wafers

Proceedings Article | 13 March 2009
Proc. SPIE. 7275, Design for Manufacturability through Design-Process Integration III
KEYWORDS: Lithography, Reticles, Atrial fibrillation, Manufacturing, Electroluminescence, Photomasks, Optical proximity correction, Semiconducting wafers, Autoregressive models, Model-based design

Proceedings Article | 4 December 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Manufacturing, Printing, Optical proximity correction, SRAF, Critical dimension metrology, Optimization (mathematics), Semiconducting wafers, Model-based design, Resolution enhancement technologies

Proceedings Article | 24 March 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Lithography, Optical lithography, Data modeling, Calibration, Scanning electron microscopy, Finite element methods, Optical proximity correction, Semiconducting wafers, Model-based design, Process modeling

Showing 5 of 6 publications
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