Dr. Ryan A. Mesch
Materials Engineer at Intel Corp
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Thin films, Deep ultraviolet, Polymers, Ultraviolet radiation, Diffusion, Bioalcohols, Photoresist materials, Extreme ultraviolet lithography, Semiconducting wafers, Absorption

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Optical lithography, Polymers, Diffusion, Chemistry, Scanning electron microscopy, Photomasks, Absorbance, Chemical analysis, Line edge roughness

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