Dr. Ryan A. Mesch
Materials Engineer at Intel Corp
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Polymers, Ultraviolet radiation, Extreme ultraviolet lithography, Absorption, Photoresist materials, Semiconducting wafers, Deep ultraviolet, Diffusion, Thin films, Bioalcohols

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Line edge roughness, Polymers, Lithography, Diffusion, Optical lithography, Photomasks, Chemical analysis, Scanning electron microscopy, Absorbance, Chemistry

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