Dr. Ryan H. Miyakawa
Project Scientist at Lawrence Berkeley National Lab
SPIE Involvement:
Author
Publications (26)

PROCEEDINGS ARTICLE | October 12, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Monochromatic aberrations, Data modeling, Error analysis, Interferometry, Wavefronts, Objectives, Optical resolution, Extreme ultraviolet, Projection lithography, Shearing interferometers

PROCEEDINGS ARTICLE | October 9, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Mathematical modeling, Diffraction, Interferometers, Sensors, Interferometry, Wavefronts, Extreme ultraviolet, Geometrical optics, Wavefront metrology, Shearing interferometers

PROCEEDINGS ARTICLE | October 27, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Microscopes, Reticles, Modulation, Imaging systems, Lenses, Scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Monochromatic aberrations, Metrology, Sensors, Inspection, Interferometry, Wavefront sensors, Wavefronts, Optical testing, Extreme ultraviolet, Semiconducting wafers, Shearing interferometers

SPIE Journal Paper | July 12, 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Photomasks, Extreme ultraviolet, Microscopes, Extreme ultraviolet lithography, Semiconducting wafers, Scanners, Modulation, Multilayers, Fiber optic illuminators, Nickel

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Microscopes, Multilayers, Modulation, Lenses, Scanners, Nickel, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, EUV optics

Showing 5 of 26 publications
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