Dr. Ryan Pearman
Chief scientist at D2S, inc
SPIE Involvement:
Conference Program Committee | Author
Publications (5)

PROCEEDINGS ARTICLE | October 31, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Point spread functions, Data modeling, Scattering, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Raster graphics, Electro optical modeling, Process modeling, Vestigial sideband modulation

PROCEEDINGS ARTICLE | July 13, 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Metrology, Backscatter, Time metrology, Thermal effects, Mathematics, Photomasks, Beam shaping, Thermal modeling, Vestigial sideband modulation, Temperature metrology

PROCEEDINGS ARTICLE | July 13, 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Point spread functions, Manufacturing, Photomasks, Extreme ultraviolet, SRAF, Nanoimprint lithography, Line edge roughness, Semiconducting wafers, Vestigial sideband modulation

PROCEEDINGS ARTICLE | July 13, 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Modeling, Lithography, Point spread functions, Ultraviolet radiation, Photomasks, Extreme ultraviolet, Mask making

PROCEEDINGS ARTICLE | July 13, 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Electron beam lithography, Data modeling, Computer simulations, Photomasks, Optical proximity correction, Mask making, Computer aided design, Reactive ion etching, Model-based design, Process modeling

Conference Committee Involvement (2)
Optical Microlithography XXX
28 February 2017 | San Jose, California, United States
Optical Microlithography XXIX
23 February 2016 | San Jose, California, United States
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