Ryo Tsujimura
at Fujitsu Labs
SPIE Involvement:
Author
Publications (5)

SPIE Journal Paper | 7 August 2012
JM3 Vol. 11 Issue 3
KEYWORDS: Optical alignment, Electron beam direct write lithography, Electron beams, Overlay metrology, Control systems, Semiconducting wafers, Metals, Back end of line, Backscatter, Electron beam lithography

Proceedings Article | 21 March 2012
Proc. SPIE. 8323, Alternative Lithographic Technologies IV
KEYWORDS: Electron beam lithography, Electron beams, Backscatter, Metals, Control systems, Optical alignment, Electron beam direct write lithography, Photoresist processing, Semiconducting wafers, Overlay metrology

Proceedings Article | 19 May 2011
Proc. SPIE. 8081, Photomask and Next-Generation Lithography Mask Technology XVIII
KEYWORDS: Semiconductors, Digital image processing, Graphics processing units, Manufacturing, Computing systems, Fourier transforms, Data processing, Distributed computing, Photomasks, Optical proximity correction

Proceedings Article | 30 July 2002
Proc. SPIE. 4691, Optical Microlithography XV
KEYWORDS: Lithography, Etching, Computing systems, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Optics manufacturing, Model-based design, Phase shifts

Proceedings Article | 25 August 1999
Proc. SPIE. 3748, Photomask and X-Ray Mask Technology VI
KEYWORDS: Phase shifting, X-rays, Amplifiers, Very large scale integration, Photomasks, Optical proximity correction, Computer aided design, Parallel computing, X-ray technology, CAD systems

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