Ryoichi Hirano
Chief Specialist at NuFlare Technology, Inc.
SPIE Involvement:
Author
Publications (53)

SPIE Journal Paper | June 24, 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Defect detection, Inspection, Photomasks, Signal detection, Extreme ultraviolet lithography, Detection and tracking algorithms, Image processing, Optimization (mathematics), Extreme ultraviolet, Electron microscopes

PROCEEDINGS ARTICLE | May 10, 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Defect detection, Imaging systems, Sensors, Image processing, Inspection, Electron microscopes, Image sensors, Photomasks, Extreme ultraviolet lithography, Defect inspection

PROCEEDINGS ARTICLE | March 24, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Oxides, Multilayers, Metrology, Contamination, Defect detection, Metals, Crystals, Inspection, Monte Carlo methods, Image quality, Photomasks, Extreme ultraviolet, Selenium, Ruthenium

SPIE Journal Paper | March 22, 2016
JM3 Vol. 15 Issue 01
KEYWORDS: Inspection, Scanning electron microscopy, Defect detection, Extreme ultraviolet, Line edge roughness, Image processing, Image resolution, Ultraviolet detectors, Photomasks, Electron microscopes

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Defect detection, Detection and tracking algorithms, Image processing, Inspection, Electron microscopes, Optical inspection, Image sensors, Data processing, Photomasks, Extreme ultraviolet, Image enhancement, Extreme ultraviolet lithography, Signal detection

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Microscopes, Multilayers, Reflectivity, Image quality

Showing 5 of 53 publications
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