Ryoichi Yoshikawa
Managing Director at NuFlare Technology Inc
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Amplifiers, Data processing, Photomasks, Extreme ultraviolet lithography, Immersion lithography, Mask making, Data conversion, Data corrections, Data storage servers

PROCEEDINGS ARTICLE | August 28, 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Semiconductors, Logic, Photomasks, Beam shaping, Optical proximity correction, Data conversion, Data centers, Electron beam direct write lithography, Vestigial sideband modulation, Resolution enhancement technologies

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top