Ryoji Hagiwara
Manager of Mask Repair at SII Nanotechnology Inc
SPIE Involvement:
Author
Publications (21)

PROCEEDINGS ARTICLE | July 22, 2014
Proc. SPIE. 9145, Ground-based and Airborne Telescopes V
KEYWORDS: Telescopes, Mirrors, Electronics, Cameras, Reflectivity, Physics, Space telescopes, Gamma radiation, Optical instrument design, Atmospheric Cherenkov telescopes

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Etching, Image processing, Reflectivity, Chromium, Scanning electron microscopy, Bridges, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Etching, Chemical species, Ions, Silicon, Reflectivity, Chromium, Extreme ultraviolet, Molybdenum, Gallium, Absorption

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Etching, Image processing, Reflectivity, Scanning electron microscopy, Bridges, Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Tantalum, Isotropic etching

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Etching, Chemical species, Ions, Silicon, Reflectivity, Ion beams, Photomasks, Extreme ultraviolet, Gallium, Absorption

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Nanotechnology, Data modeling, Error analysis, Parallel processing, Data processing, Photomasks, Explosives, Optical proximity correction, Data conversion, Standards development

Showing 5 of 21 publications
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