Ryouichirou Naitou
Staff Engineer at Tokyo Electron Kyushu Ltd
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | April 4, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Metrology, Scanners, Particles, Manufacturing, Inspection, Bridges, High volume manufacturing, Critical dimension metrology, Semiconducting wafers, Standards development

PROCEEDINGS ARTICLE | April 1, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Reticles, Lithographic illumination, Scanning electron microscopy, Printing, Double patterning technology, Optical proximity correction, Critical dimension metrology, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | April 2, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Carbon, Lithography, Diffractive optical elements, Polymers, Control systems, Humidity, Fermium, Critical dimension metrology, Photoresist processing, Environmental sensing

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Etching, Satellites, Laser processing, Scanning electron microscopy, Immersion lithography, Thin film coatings, Photoresist processing, Semiconducting wafers, Liquids

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Satellites, Polymers, Particles, Reflectivity, Control systems, Excimer lasers, Excimers, Photoresist processing, Chemically amplified resists

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Defect detection, Polymers, Particles, Manufacturing, Infrared radiation, Photoresist processing, Semiconducting wafers, Arsenic, Chemically amplified resists

Showing 5 of 8 publications
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