Dr. Ryoung-Han R. Kim
at imec
SPIE Involvement:
Conference Co-Chair | Editor | Author
Publications (64)

Proceedings Article | 25 March 2020
Proc. SPIE. 11328, Design-Process-Technology Co-optimization for Manufacturability XIV

Proceedings Article | 23 March 2020
Proc. SPIE. 11328, Design-Process-Technology Co-optimization for Manufacturability XIV
KEYWORDS: Image processing, Optical proximity correction, Machine learning, Computer programming, Photomasks, Stochastic processes, Defect inspection, Semiconducting wafers, Analytical research, Vector spaces

Proceedings Article | 26 September 2019
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Vestigial sideband modulation, Optical proximity correction, Standards development, Nanotechnology, Nanofabrication, Two photon polymerization, Adaptive optics, Electronic design automation, Metals, Mask making

Proceedings Article | 29 August 2019
Proc. SPIE. 11177, 35th European Mask and Lithography Conference (EMLC 2019)
KEYWORDS: Extreme ultraviolet, Photomasks, Pellicles, Extreme ultraviolet lithography, Manufacturing, Semiconducting wafers, High volume manufacturing, Critical dimension metrology, Inspection, Logic

Proceedings Article | 4 June 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Transistors, Logic, Extreme ultraviolet, Stochastic processes, Metals, Printing, Bridges, Semiconducting wafers, Optical lithography, Lithography

Showing 5 of 64 publications
Proceedings Volume Editor (1)

Conference Committee Involvement (4)
Design-Technology Co-optimization XV
21 February 2021 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability XIV
26 February 2020 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability XIII
27 February 2019 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability XII
28 February 2018 | San Jose, California, United States
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