Dr. Ryoung-Han R. Kim
Sr. Manager at IMEC
SPIE Involvement:
Conference Program Committee | Author
Publications (52)

PROCEEDINGS ARTICLE | April 23, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Semiconductors, Lithography, Optical lithography, Metals, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Double patterning technology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 23, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Optical lithography, Etching, Metals, Copper, Resistance, Photomasks, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Tin

PROCEEDINGS ARTICLE | March 21, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Logic, Optical lithography, Etching, Scanning electron microscopy, Photomasks, Extreme ultraviolet, SRAF, Photoresist processing, Stochastic processes, Tin

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10588, Design-Process-Technology Co-optimization for Manufacturability XII
KEYWORDS: Logic, Optical lithography, Metals, Dielectrics, Silicon, Photomasks, Extreme ultraviolet, Transistors, Standards development

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10588, Design-Process-Technology Co-optimization for Manufacturability XII
KEYWORDS: Lithography, Logic, Optical lithography, Metals, Manufacturing, Extreme ultraviolet, Extreme ultraviolet lithography, New and emerging technologies, Back end of line

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10588, Design-Process-Technology Co-optimization for Manufacturability XII
KEYWORDS: Lithography, Optical lithography, Metals, Copper, Cobalt, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Standards development, Back end of line

Showing 5 of 52 publications
Conference Committee Involvement (2)
Design-Process-Technology Co-optimization for Manufacturability XIII
27 February 2019 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability XII
28 February 2018 | San Jose, California, United States
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