Dr. Ryoung-Han R. Kim
Sr. Manager at IMEC
SPIE Involvement:
Conference Program Committee | Author
Publications (57)

Proceedings Article | 18 March 2019
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Optical lithography, Etching, Metals, Error analysis, Extreme ultraviolet, Source mask optimization, Critical dimension metrology, Line edge roughness, Stochastic processes, Edge roughness

Proceedings Article | 18 March 2019
Proc. SPIE. 10963, Advanced Etch Technology for Nanopatterning VIII
KEYWORDS: Metrology, Optical lithography, Data modeling, Calibration, Metals, Monte Carlo methods, Cadmium sulfide, Critical dimension metrology, Astatine, Back end of line

Proceedings Article | 18 March 2019
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Lithography, Optical lithography, Metals, Silicon, Manufacturing, Capacitance, Extreme ultraviolet, Design for manufacturability

Proceedings Article | 18 March 2019
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Logic, Fin field effect transistors, Electrodes, Metals, Very large scale integration, Transistors, Field effect transistors, Front end of line, Nanowires

Proceedings Article | 14 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Logic, Optical lithography, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Computational lithography, High volume manufacturing

Proceedings Article | 23 April 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Semiconductors, Lithography, Optical lithography, Metals, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Double patterning technology, Semiconducting wafers

Showing 5 of 57 publications
Conference Committee Involvement (2)
Design-Process-Technology Co-optimization for Manufacturability XIII
27 February 2019 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability XII
28 February 2018 | San Jose, California, United States
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