Dr. Ryousuke Yamamoto Profile

Dr. Ryousuke Yamamoto

at Toshiba Corp

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Author

Publications (5)

Proceedings Article | 28 March 2017 Presentation + Paper

Wide-range directed self-assembly lithography enabling wider range of applicable pattern size for both hexagonal multi-hole and line/space

Seiji Morita, Ryuichi Saito, Ryosuke Yamamoto, Norikatsu Sasao, Tomoaki Sawabe, Koji Asakawa, Shinobu Sugimura

Proceedings Volume 10144, 101440R (2017) https://doi.org/10.1117/12.2257987

KEYWORDS: Lithography, Dry etching, Immersion lithography, Annealing, Resistance, Double patterning technology, Molecular self-assembly, Optical lithography, Scanning electron microscopy, Organic materials, Directed self assembly, Semiconducting wafers, Reactive ion etching, Metals

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Proceedings Article | 4 April 2016 Paper

Sub-15nm patterning technology using directed self-assembly on nano-imprinting guide

Seiji Morita, Masahiro Kanno, Ryousuke Yamamoto, Norikatsu Sasao, Shinobu Sugimura

Proceedings Volume 9777, 97770K (2016) https://doi.org/10.1117/12.2219141

KEYWORDS: Directed self assembly, Nanoimprint lithography, Optical lithography, Lithography, Quartz, Line edge roughness, Image processing, Photoresist processing, Line width roughness, Coating

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Proceedings Article | 26 March 2013 Paper

Orientation and position-controlled block copolymer nanolithography for bit-patterned media

R. Yamamoto, M. Kanamaru, K. Sugawara, N. Sasao, Y. Ootera, T. Okino, H. Hieda, N. Kihara, Y. Kamata, A. Kikitsu

Proceedings Volume 8680, 86801U (2013) https://doi.org/10.1117/12.2012654

KEYWORDS: Beam propagation method, Magnetism, Lithography, Carbon, Nanolithography, Photomasks, Reactive ion etching, Scanning electron microscopy, Servomechanisms, Directed self assembly

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Proceedings Article | 21 March 2012 Paper

Evaluation of ordering of directed self-assembly of block copolymers with pre-patterned guides for bit patterned media

Takeshi Okino, Takuya Shimada, Akiko Yuzawa, Ryosuke Yamamoto, Naoko Kihara, Yoshiyuki Kamata, Akira Kikitsu, Takashi Akahane, You Yin, Sumio Hosaka

Proceedings Volume 8323, 83230S (2012) https://doi.org/10.1117/12.916304

KEYWORDS: Magnetism, Beam propagation method, Scanning electron microscopy, Image analysis, Servomechanisms, Reactive ion etching, Electron beam lithography, Etching, Oxygen, Directed self assembly

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Proceedings Article | 2 April 2011 Paper

Nanoimprint process for 2.5Tb/in2 bit patterned media fabricated by self-assembling method

Yasuaki Ootera, Akiko Yuzawa, Takuya Shimada, Ryousuke Yamamoto, Yoshiyuki Kamata, Naoko Kihara, Akira Kikitsu

Proceedings Volume 7970, 79700K (2011) https://doi.org/10.1117/12.878936

KEYWORDS: Beam propagation method, Silicon, Etching, Servomechanisms, Nickel, Nanoimprint lithography, Magnetism, Photomasks, Ultraviolet radiation, Electroplating

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