Dr. Ryousuke Yamamoto
at Toshiba Corp
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Lithography, Optical lithography, Dry etching, Metals, Annealing, Resistance, Scanning electron microscopy, Organic materials, Directed self assembly, Double patterning technology, Immersion lithography, Reactive ion etching, Semiconducting wafers, Molecular self-assembly

PROCEEDINGS ARTICLE | April 4, 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Lithography, Optical lithography, Quartz, Image processing, Coating, Line width roughness, Directed self assembly, Nanoimprint lithography, Line edge roughness, Photoresist processing

PROCEEDINGS ARTICLE | March 26, 2013
Proc. SPIE. 8680, Alternative Lithographic Technologies V
KEYWORDS: Carbon, Lithography, Magnetism, Scanning electron microscopy, Photomasks, Directed self assembly, Servomechanisms, Reactive ion etching, Beam propagation method, Nanolithography

PROCEEDINGS ARTICLE | March 21, 2012
Proc. SPIE. 8323, Alternative Lithographic Technologies IV
KEYWORDS: Electron beam lithography, Etching, Magnetism, Image analysis, Oxygen, Scanning electron microscopy, Directed self assembly, Servomechanisms, Reactive ion etching, Beam propagation method

PROCEEDINGS ARTICLE | April 2, 2011
Proc. SPIE. 7970, Alternative Lithographic Technologies III
KEYWORDS: Etching, Ultraviolet radiation, Nickel, Silicon, Magnetism, Photomasks, Servomechanisms, Nanoimprint lithography, Electroplating, Beam propagation method

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