Dr. Steve S. Putna
Engineering Manager at Intel Corp
SPIE Involvement:
Conference Program Committee | Author
Publications (11)

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Extreme ultraviolet lithography, Nanoparticles, Extreme ultraviolet, Optical lithography, Metals, Spectroscopy, FT-IR spectroscopy, Scanning electron microscopy, Ultraviolet radiation, Particles

PROCEEDINGS ARTICLE | April 8, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Line width roughness, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Photoresist materials, Photoresist developing, Materials processing, Lithography, Etching, Scanning electron microscopy

PROCEEDINGS ARTICLE | March 23, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Line width roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Mirrors, Photoresist materials, Semiconducting wafers, Printing, Modulation, Photomasks, Photoresist developing

PROCEEDINGS ARTICLE | March 20, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Line width roughness, Extreme ultraviolet, Extreme ultraviolet lithography, Standards development, Lithography, Photoresist processing, Optical lithography, Photoresist materials, Lithographic illumination, Lead

PROCEEDINGS ARTICLE | March 20, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Defect inspection, Optical inspection, Particles, Reflectivity, Manufacturing, Deep ultraviolet

PROCEEDINGS ARTICLE | March 20, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Extreme ultraviolet, Scanning electron microscopy, Line width roughness, Optical lithography, Photoresist materials, Lithography, Metrology

Showing 5 of 11 publications
Conference Committee Involvement (8)
Advances in Patterning Materials and Processes XXXVI
24 February 2019 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXV
27 February 2018 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXIV
28 February 2017 | San Jose, California, United States
Advances in Resist Materials and Processing Technology XXVI
23 February 2009 | San Jose, California, United States
Advances in Resist Materials and Processing Technology XXV
25 February 2008 | San Jose, California, United States
Showing 5 of 8 published special sections
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