Dr. Steve S. Putna
Engineering Manager at Intel Corp
SPIE Involvement:
Conference Program Committee | Author
Publications (11)

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: FT-IR spectroscopy, Optical lithography, Nanoparticles, Metals, Spectroscopy, Ultraviolet radiation, Particles, Scanning electron microscopy, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | April 8, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Etching, Materials processing, Scanning electron microscopy, Photoresist materials, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Photoresist processing, Photoresist developing

PROCEEDINGS ARTICLE | March 23, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Mirrors, Modulation, Printing, Photoresist materials, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Photoresist developing

PROCEEDINGS ARTICLE | March 20, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Photoresist materials, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Photoresist processing, Standards development, Lead

PROCEEDINGS ARTICLE | March 20, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Deep ultraviolet, Particles, Manufacturing, Inspection, Reflectivity, Optical inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Defect inspection

PROCEEDINGS ARTICLE | March 20, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Lithography, Metrology, Optical lithography, Scanning electron microscopy, Photoresist materials, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers

Showing 5 of 11 publications
Conference Committee Involvement (8)
Advances in Patterning Materials and Processes XXXVI
24 February 2019 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXV
27 February 2018 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXIV
28 February 2017 | San Jose, California, United States
Advances in Resist Materials and Processing Technology XXVI
23 February 2009 | San Jose, California, United States
Advances in Resist Materials and Processing Technology XXV
25 February 2008 | San Jose, California, United States
Showing 5 of 8 published special sections
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