High-resolution defect inspection of step-and-flash imprint lithography for 32-nm half-pitch patterning
High resolution defect inspection of step and flash imprint lithography for 32 nm half-pitch patterning
Fabrication of nanometer sized features on non-flat substrates using a nano-imprint lithography process
Step and flash imprint lithography (S-FIL) is an attractive method for printing sub-100-nm geometries. Relative to other imprinting processes, S-FIL has the advantage of the template being transparent, thereby facilitating conventional overlay techniques.