Dr. S. Wilson
Applications Engg Manager at
SPIE Involvement:
Author
Publications (9)

PROCEEDINGS ARTICLE | December 8, 1995
Proc. SPIE. 2621, 15th Annual BACUS Symposium on Photomask Technology and Management
KEYWORDS: Lithography, Reticles, Metrology, Quartz, Glasses, Light scattering, Manufacturing, Inspection, Printing, Photomasks

PROCEEDINGS ARTICLE | May 22, 1995
Proc. SPIE. 2439, Integrated Circuit Metrology, Inspection, and Process Control IX
KEYWORDS: Oxides, Diffraction, Etching, Quartz, Atomic force microscopy, Scatterometry, Photomasks, Scatter measurement, Phase shifts, Diffraction gratings

PROCEEDINGS ARTICLE | December 7, 1994
Proc. SPIE. 2322, 14th Annual BACUS Symposium on Photomask Technology and Management
KEYWORDS: Diffraction, Metrology, Etching, Quartz, Atomic force microscopy, Scatterometry, Photomasks, Scatter measurement, Phase shifts, Diffraction gratings

PROCEEDINGS ARTICLE | March 26, 1993
Proc. SPIE. 1809, 12th Annual BACUS Symposium on Photomask Technology and Management
KEYWORDS: Phase shifting, Sensors, Etching, Quartz, Light scattering, Surface roughness, Scatterometry, Ion beams, Photomasks, Phase shifts

PROCEEDINGS ARTICLE | August 1, 1992
Proc. SPIE. 1661, Machine Vision Applications in Character Recognition and Industrial Inspection
KEYWORDS: Diffraction, Statistical analysis, Cameras, Light scattering, Fourier transforms, Neural networks, Line edge roughness, Semiconducting wafers, Edge roughness, Diffraction gratings

PROCEEDINGS ARTICLE | June 1, 1992
Proc. SPIE. 1673, Integrated Circuit Metrology, Inspection, and Process Control VI
KEYWORDS: Diffraction, Cadmium, Metals, Light scattering, Photoresist materials, Process control, Critical dimension metrology, Semiconducting wafers, Diffraction gratings, Picture Archiving and Communication System

Showing 5 of 9 publications
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