Dr. Samoto Norihiko
at JEOL (UK) Ltd
SPIE Involvement:
Author
Publications (9)

PROCEEDINGS ARTICLE | May 25, 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Electronics, Manufacturing, Reliability, Inspection, Magnetism, Diagnostics, Data processing, Photomasks, System integration, Environmental sensing

PROCEEDINGS ARTICLE | April 3, 2010
Proc. SPIE. 7637, Alternative Lithographic Technologies II
KEYWORDS: Electronics, Error analysis, Inspection, Magnetism, Diagnostics, Amplifiers, Data processing, Photomasks, System integration, Signal detection

PROCEEDINGS ARTICLE | May 11, 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Lithography, Data storage, Reliability, Computing systems, Control systems, Data processing, Photomasks, Optical proximity correction, Digital recording, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Environmental monitoring, Reliability, Inspection, Diagnostics, Amplifiers, Data processing, Photomasks, Analog electronics, System integration, Signal detection

SPIE Journal Paper | April 1, 2005
JM3 Vol. 4 Issue 02
KEYWORDS: Photomasks, Semiconducting wafers, Charged-particle lithography, Electron beams, Optical alignment, Distortion, Electron beam lithography, Wafer-level optics, Projection lithography, Scanners

PROCEEDINGS ARTICLE | May 20, 2004
Proc. SPIE. 5374, Emerging Lithographic Technologies VIII
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Scanners, Distortion, Photomasks, Optical alignment, Semiconducting wafers, Data corrections, Charged-particle lithography

Showing 5 of 9 publications
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