Dr. Samoto Norihiko
at JEOL (UK) Ltd
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 25 May 2010 Paper
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Electronics, Manufacturing, Reliability, Inspection, Magnetism, Diagnostics, Data processing, Photomasks, System integration, Environmental sensing

Proceedings Article | 3 April 2010 Paper
Proc. SPIE. 7637, Alternative Lithographic Technologies II
KEYWORDS: Electronics, Error analysis, Inspection, Magnetism, Diagnostics, Amplifiers, Data processing, Photomasks, System integration, Signal detection

Proceedings Article | 11 May 2009 Paper
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Lithography, Data storage, Reliability, Computing systems, Control systems, Data processing, Photomasks, Optical proximity correction, Digital recording, Resolution enhancement technologies

Proceedings Article | 18 March 2009 Paper
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Environmental monitoring, Reliability, Inspection, Diagnostics, Amplifiers, Data processing, Photomasks, Analog electronics, System integration, Signal detection

SPIE Journal Paper | 1 April 2005
JM3 Vol. 4 Issue 02
KEYWORDS: Photomasks, Semiconducting wafers, Charged-particle lithography, Electron beams, Optical alignment, Distortion, Electron beam lithography, Wafer-level optics, Projection lithography, Scanners

Showing 5 of 9 publications
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