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Satoshi Nakamura
at Shibaura Mechatronics Corp
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Publications (1)
Proceedings Article | 21 October 2014 Paper
The study on EUV mask cleaning without Ru surface damage
Daisuke Matsushima, Kensuke Demura, Satoshi Nakamura, Masafumi Suzuki, Katsuhiro Kishimoto, Makoto Muto
Proceedings Volume 9235, 923518 (2014) https://doi.org/10.1117/12.2070235
KEYWORDS: Extreme ultraviolet, Ruthenium, Reflectivity, Plasma, Mechatronics, Mask cleaning, Natural surfaces, Plasma systems, Transmission electron microscopy, Atomic force microscopy
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