Dr. Sabita Roy
Applications Development Engg
SPIE Involvement:
Publications (5)

SPIE Journal Paper | 1 April 2005
JM3, Vol. 4, Issue 02, 023003, (April 2005) https://doi.org/10.1117/12.10.1117/1.1898244
KEYWORDS: Optical proximity correction, Diffractive optical elements, Critical dimension metrology, Calibration, Photomasks, Stanford Linear Collider, Fiber optic illuminators, Lithography, Printing, Logic

Proceedings Article | 3 May 2004 Paper
Proceedings Volume 5379, (2004) https://doi.org/10.1117/12.536982
KEYWORDS: Diffractive optical elements, Optical proximity correction, Calibration, Critical dimension metrology, Stanford Linear Collider, Photomasks, Fiber optic illuminators, Printing, Logic, Lithography

Proceedings Article | 2 June 2003 Paper
Sabita Roy, J. Fung Chen, Armin Liebchen, Thomas Laidig, Kurt Wampler, Uwe Hollerbach
Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.482746
KEYWORDS: Optical proximity correction, Critical dimension metrology, Cadmium, Photomasks, Monte Carlo methods, Tolerancing, Process control, Printing, Lithography, Computer programming

Proceedings Article | 30 July 2002 Paper
Stephen Hsu, Noel Corcoran, Mark Eurlings, William Knose, Thomas Laidig, Kurt Wampler, Sabita Roy, Xuelong Shi, Chungwei Michael Hsu, J. Fung Chen, Jo Finders, Robert Socha, Mircea Dusa
Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474596
KEYWORDS: Optical proximity correction, Photomasks, Reticles, Model-based design, Manufacturing, Semiconducting wafers, Scattering, Resolution enhancement technologies, Printing, Nanoimprint lithography

Proceedings Article | 16 July 2002 Paper
Sabita Roy, Ralph Schlief, Stephen Hsu, Xuelong Shi, Armin Liebchen, J. Fung Chen, Steven Hansen
Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473414
KEYWORDS: Critical dimension metrology, Optical proximity correction, Photomasks, Edge roughness, Lithographic illumination, Tolerancing, Lithography, Scanners, Printing, Scattering

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